# Fileset

[HCl-gas etching behavior of 001 -Ga2O3 under oxygen supply.pdf](https://mdr.nims.go.jp/filesets/c4ee44b9-7144-4144-9119-3c434b49fcc0/download)

## Creator

[Yuichi Oshima](https://orcid.org/0000-0001-8293-4891), [Takayoshi Oshima](https://orcid.org/0000-0001-8550-9735)

## Rights

[Creative Commons BY Attribution 4.0 International](https://creativecommons.org/licenses/by/4.0/)

## Other metadata

[HCl-gas etching of (001) β-Ga2O3 under oxygen supply](https://mdr.nims.go.jp/datasets/de0348a4-c4c5-449a-99ed-7a5109ffce6b)

## Fulltext