# Fileset

[Advanced Materials - 2026 - Li - MOCVD‐Grown MoS2 Wafers as a Transfer‐Free Platform for Top‐Gate Devices via Dry Interface.pdf](https://mdr.nims.go.jp/filesets/9f100776-ab32-4af9-9e2f-3c832c39d858/download)

## Creator

Shuhong Li, Juiteng Chang, Keisuke Atsumi, Kosei Matsumoto, Itsuki Tanaka, Tomonori Nishimura, Kaito Kanahashi, [Takahiro Nagata](https://orcid.org/0000-0002-8591-2943), Jun Nara, Yoshiki Sakuma, Emi Kano, Nobuyuki Ikarashi, [Kosuke Nagashio](https://orcid.org/0000-0003-1181-8644)

## Rights

[Creative Commons BY-NC Attribution-NonCommercial 4.0 International](https://creativecommons.org/licenses/by-nc/4.0/)

## Other metadata

[MOCVD‐Grown MoS                    <sub>2</sub>                    Wafers as a Transfer‐Free Platform for Top‐Gate Devices via Dry Interface Engineering](https://mdr.nims.go.jp/datasets/5eb498f5-9e46-434b-98e5-f85d34c12f22)

## Fulltext