# Fileset

[APEX-107351.docx](https://mdr.nims.go.jp/filesets/9a9ae61f-0484-4943-87a9-cfaa0766d3e4/download)

## Creator

[Takayoshi Oshima](https://orcid.org/0000-0001-8550-9735), [Yuichi Oshima](https://orcid.org/0000-0001-8293-4891)

## Rights

© 2023 The Japan Society of Applied Physic <br>
This is an author-created, un-copyedited version of an article accepted for publication/published in Applied Physics Express. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or
any version derived from it. The Version of Record is available online at https://doi.org/10.35848/1882-0786/acdbb7.[Creative Commons BY-NC-ND Attribution-NonCommercial-NoDerivs 4.0 International](https://creativecommons.org/licenses/by-nc-nd/4.0/)

## Other metadata

[Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate](https://mdr.nims.go.jp/datasets/7454efb6-5194-4d17-bca8-18ba262be36e)

## Fulltext