# Fileset

[T. Oshima_Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography.docx](https://mdr.nims.go.jp/filesets/57c9e2aa-e96f-4be9-9e75-ec8019d5058a/download)

## Creator

[Takayoshi Oshima](https://orcid.org/0000-0001-8550-9735)

## Rights

© 2023 The Japan Society of Applied Physics<br>This is an author-created, un-copyedited version of an article accepted for publication/published in Japanese Journal of Applied Physics. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at  https://doi.org/10.35848/1347-4065/acb0b3.[In Copyright](http://rightsstatements.org/vocab/InC/1.0/)

## Other metadata

[Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography](https://mdr.nims.go.jp/datasets/8785e79a-3dee-41c4-9380-48d7bc21e802)

## Fulltext