# Fileset

[paper_-112.pdf](https://mdr.nims.go.jp/filesets/20623479-49f1-4406-8bce-2cca2c123c51/download)

## Creator

[Takayoshi Oshima](https://orcid.org/0000-0001-8550-9735), [Yuichi Oshima](https://orcid.org/0000-0001-8293-4891)

## Rights

[Creative Commons BY Attribution 4.0 International](https://creativecommons.org/licenses/by/4.0/)

## Other metadata

[HCl-based halide vapor phase epitaxy and selective-area HCl gas etching of (−112) β-Ga                    <sub>2</sub>                    O                    <sub>3</sub>](https://mdr.nims.go.jp/datasets/ab03d179-9596-4c80-9dfe-2b3f4bc2b02e)

## Fulltext