Reference-Free Quantitative Mass Spectrometry Enables Sequencing of Resist Copolymers and Reveals Sequence-Dependent Deprotection Sensitivity

Article

Creator

Yusuke Hibi ; Yasuyuki Nakamura ; Shiho Uesaka ; Masanobu Naito

Keyword

polymer sequencing, monomer sequence analysis, pyrolysis mass spectrometry, photoresist, non-negative matrix factorization, reference-free quantitative mass spectrometry

Date published

2026-02-10

Updated at

2026-02-13 16:30:15 +0900