Robust Preparation of Sub‐20‐nm‐Thin Lamellae for Aberration‐Corrected Electron Microscopy

Article

Creator

Hideyo Tsurusawa ; Jun Uzuhashi ; Yusuke Kozuka ; Koji Kimoto ; Tadakatsu Ohkubo

Keyword

TEM, FIB, Automation

Date published

2024-02-22

Updated at

2024-05-03 08:30:11 +0900