Reference-Free Quantitative Mass Spectrometry Enables Sequencing of Resist Copolymers and Reveals Sequence-Dependent Deprotection Sensitivity

ジャーナル論文

著者

Yusuke Hibi (author) (この著者で検索)

https://orcid.org/0000-0003-4006-1070

NIMS Researchers Directory SAMURAI

Yusuke Hibi ;

Yasuyuki Nakamura (author) (この著者で検索)

https://orcid.org/0000-0003-0078-6413

NIMS Researchers Directory SAMURAI

Yasuyuki Nakamura ;

Shiho Uesaka (author) (この著者で検索)

Shiho Uesaka ;

Masanobu Naito (author) (この著者で検索)

https://orcid.org/0000-0001-7198-819X

NIMS Researchers Directory SAMURAI

Masanobu Naito

キーワード

polymer sequencing, monomer sequence analysis, pyrolysis mass spectrometry, photoresist, non-negative matrix factorization, reference-free quantitative mass spectrometry

刊行年月日

2026-02-10

更新時刻

2026-02-13 16:30:15 +0900