File type: application/pdf Keyword: interface engineering

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T. Onaya and T. Nabatame, Jpn. J. Appl. Phys. 65, 080804 (2026)..pdf
Interface engineering of HfO 2 -based ferroelectric devices for crystal phase control and enhanced ferroelectricity using atomic-layer-deposited ZrO 2 nucleation layers
Journal article
Creator
Takashi Onaya (author) (Search by this author)
National Institute for Materials Science
ORCID ;
Toshihide Nabatame (author) (Search by this author)
ORCID SAMURAI
Keyword
atomic layer deposition, ferroelectric HfO2-based thin films, memory devices, interface engineering, crystal phase control
Date published
2026-04-30
Updated at
2026-07-13 17:01:06 +0900

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