Reference-Free Quantitative Mass Spectrometry Enables Sequencing of Resist Copolymers and Reveals Sequence-Dependent Deprotection Sensitivity

Journal article

Creator

Yusuke Hibi (author) (Search by this author)

https://orcid.org/0000-0003-4006-1070

NIMS Researchers Directory SAMURAI

Yusuke Hibi ;

Yasuyuki Nakamura (author) (Search by this author)

https://orcid.org/0000-0003-0078-6413

NIMS Researchers Directory SAMURAI

Yasuyuki Nakamura ;

Shiho Uesaka (author) (Search by this author)

Shiho Uesaka ;

Masanobu Naito (author) (Search by this author)

https://orcid.org/0000-0001-7198-819X

NIMS Researchers Directory SAMURAI

Masanobu Naito

Keyword

polymer sequencing, monomer sequence analysis, pyrolysis mass spectrometry, photoresist, non-negative matrix factorization, reference-free quantitative mass spectrometry

Date published

2026-02-10

Updated at

2026-02-13 16:30:15 +0900