# Hypotaxy of wafer-scale single-crystal transition metal dichalcogenides

https://mdr.nims.go.jp/datasets/f827eb5f-3cf1-4497-ad69-45e166491dfe

## File

- [2025A01022G_Nature_Hypotaxy of Wafer-scale Single Crystal Transition Metal Dichalcogenides.docx](https://mdr.nims.go.jp/filesets/4384d2ba-3982-4bee-9a89-21f579deaa39/download) ([Detail](https://mdr.nims.go.jp/filesets/4384d2ba-3982-4bee-9a89-21f579deaa39.md))

## Id

f827eb5f-3cf1-4497-ad69-45e166491dfe

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2026-07-02T02:47:45.852186Z

## Updated at

2026-07-03T07:14:43.655639Z

## Published at

2026-07-03T09:30:20.352534Z

## Doi



## First published url

https://doi.org/10.1038/s41586-024-08492-9

## Date published

2025-02-27

## Recorded date published

2025-2-27

## Resource type

journal_article

## Manuscript type

accepted_manuscript

## Collection



## Title

- title: Hypotaxy of wafer-scale single-crystal transition metal dichalcogenides
  title_type: original
  lang: en

## Description

- description: Two-dimensional (2D) semiconductors, particularly transition metal
    dichalcogenides (TMDs), are promising for advanced electronics beyond silicon1,2,3.
    Traditionally, TMDs are epitaxially grown on crystalline substrates by chemical
    vapour deposition. However, this approach requires post-growth transfer to target
    substrates, which makes controlling thickness and scalability difficult. Here
    we introduce a method called hypotaxy (‘hypo’ meaning downward and ‘taxy’ meaning
    arrangement), which enables wafer-scale single-crystal TMD growth directly on
    various substrates, including amorphous and lattice-mismatched substrates, while
    preserving crystalline alignment with an overlying 2D template. By sulfurizing
    or selenizing a pre-deposited metal film under graphene, aligned TMD nuclei form,
    coalescing into a single-crystal film as graphene is removed. This method achieves
    precise MoS2 thickness control from monolayer to hundreds of layers on diverse
    substrates, producing 4-inch single-crystal MoS2 with high thermal conductivity
    (about 120 W m−1 K−1) and mobility (around 87 cm2 V−1 s−1). Furthermore, nanopores
    created in graphene using oxygen plasma treatment allow MoS2 growth at a lower
    temperature of 400 °C, compatible with back-end-of-line processes. This hypotaxy
    approach extends to other TMDs, such as MoSe2, WS2 and WSe2, offering a solution
    to substrate limitations in conventional epitaxy and enabling wafer-scale TMDs
    for monolithic three-dimensional integration.
  description_type: abstract
  lang: en

## Creator

- name: Donghoon Moon
  role: author
- name: Wonsik Lee
  role: author
- name: Chaesung Lim
  role: author
- name: Jinwoo Kim
  role: author
- name: Jiwoo Kim
  role: author
- name: Yeonjoon Jung
  role: author
- name: Hyun-Young Choi
  role: author
- name: Won Seok Choi
  role: author
- name: Hangyel Kim
  role: author
- name: Ji-Hwan Baek
  role: author
- name: Changheon Kim
  role: author
- name: Jaewoong Joo
  role: author
- name: Hyun-Geun Oh
  role: author
- name: Hajung Jang
  role: author
- name: Kenji Watanabe
  role: author
  orcid: https://orcid.org/0000-0003-3701-8119
  organization: National Institute for Materials Science
- name: Takashi Taniguchi
  role: author
  orcid: https://orcid.org/0000-0002-1467-3105
  organization: National Institute for Materials Science
- name: Sukang Bae
  role: author
- name: Jangyup Son
  role: author
- name: Huije Ryu
  role: author
- name: Junyoung Kwon
  role: author
- name: Hyeonsik Cheong
  role: author
- name: Jeong Woo Han
  role: author
- name: Hyejin Jang
  role: author
- name: Gwan-Hyoung Lee
  role: author

## Contact agent



## Publisher

organization: Springer Science and Business Media LLC

## Managing organization



## Keyword

- subject: Transition metal dichalcogenides (TMDs)
  schema: not_defined
- subject: Wafer-scale single-crystal growth
  schema: not_defined
- subject: Two-dimensional (2D) semiconductors
  schema: not_defined

## Rights

- description: 'This version of the article has been accepted for publication, after
    peer review (when applicable) and is subject to Springer Nature’s AM terms of
    use, but is not the Version of Record and does not reflect post-acceptance improvements,
    or any corrections. The Version of Record is available online at: https://doi.org/10.1038/s41586-024-08492-9.'
  identifier: http://rightsstatements.org/vocab/InC/1.0/

## Other identifier(s)



## Data origin

- data_origin_type: other

## Embargo

start_date: 2025-02-19
end_date: 2025-08-19

## Journal

- title: Nature
  issn: '00280836'
  volume: '638'
  issue: '8052'
  start_page: 957
  end_page: 964

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## Fileset

- id: 4384d2ba-3982-4bee-9a89-21f579deaa39
  filename: 2025A01022G_Nature_Hypotaxy of Wafer-scale Single Crystal Transition Metal
    Dichalcogenides.docx
  content_type: application/vnd.openxmlformats-officedocument.wordprocessingml.document
  size: 14707249
  md5: 6b4ceda6403610ed44642a23b1b32d75

## Thumbnail

fileset_id: 4384d2ba-3982-4bee-9a89-21f579deaa39
filename: 2025A01022G_Nature_Hypotaxy of Wafer-scale Single Crystal Transition Metal
  Dichalcogenides.docx