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説明:

To explore the impact of annealing temperature on the nucleation and subsequent growth of nanocrystalline α-Fe grains in a high saturation magnetization soft magnetic Fe84.8Si0.5B9.4P3.5Cu0.8C1.0 alloy, we conducted multiprobe analyses of the isothermal crystallization process within the 633 K to 733 K temperature range. Transmission electron microscopy and atom probe tomography observations for the samples isothermally annealed at 733 K and 633 K revealed distinct differences in microstructure. For the higher isothermal temperature, Cu clusters were larger, and α-Fe grains were finer. In contrast, for the lower isothermal temperature, Cu clusters were smaller, and α-Fe grains were coarser. Time-resolved synchrotron X-ray diffraction measurements provided a direct evidence of sporadic nucleation mechanism, highlighting the significant effect of isothermal temperature on the formation of α-Fe grains. To achieve an optimal microstructure for lower coercivity, it is crucial to control the Cu clustering and α-Fe nanocrystallization by annealing at higher temperatures for shorter durations.

権利情報:

• In Copyright
  

  This version of the article has been accepted for publication, after peer review (when applicable) and is subject to Springer Nature’s AM terms of use, but is not the Version of Record and does not reflect post-acceptance improvements, or any corrections. The Version of Record is available online at: https://doi.org/10.1007/s10853-025-10696-x

キーワード: atom probe tomography, transmission electron microscopy, nanocrystalline soft magnetic material

刊行年月日: 2025-02-10

出版者: Springer Science and Business Media LLC

掲載誌:

• Journal of Materials Science (ISSN: 00222461) vol. 60 issue. 8 p. 3988-3998

研究助成金:

• Japan Synchrotron Radiation Research Institute 2022A1737
• Japan Synchrotron Radiation Research Institute 2023A1793
• Japan Synchrotron Radiation Research Institute 2023B1747
• Ministry of Education, Culture, Sports, Science and Technology JPJ009777
• Ministry of Education, Culture, Sports, Science and Technology JPMXP1122715503

原稿種別: 著者最終稿 (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.5341

公開URL: https://doi.org/10.1007/s10853-025-10696-x

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更新時刻: 2026-02-11 08:30:29 +0900

MDRでの公開時刻: 2026-02-10 18:03:07 +0900