# Robust Preparation of Sub‐20‐nm‐Thin Lamellae for Aberration‐Corrected Electron Microscopy

https://mdr.nims.go.jp/datasets/f3976079-58be-453f-a9ae-a29f80ccf584

## File

- [Small Methods - 2024 - Tsurusawa - Robust Preparation of Sub‐20‐nm‐Thin Lamellae for Aberration‐Corrected Electron-1.pdf](https://mdr.nims.go.jp/filesets/929af870-bb5f-407d-ac06-9dd18fe3ee24/download) ([Detail](https://mdr.nims.go.jp/filesets/929af870-bb5f-407d-ac06-9dd18fe3ee24.md))

## Id

f3976079-58be-453f-a9ae-a29f80ccf584

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2024-05-02T04:24:22.293891Z

## Updated at

2024-05-02T23:30:11.587717Z

## Published at

2024-05-02T23:30:12.137972Z

## Doi



## First published url

https://doi.org/10.1002/smtd.202301425

## Date published

2024-02-22

## Recorded date published

2024-9

## Resource type

journal_article

## Manuscript type

vor

## Collection



## Title

- title: Robust Preparation of Sub‐20‐nm‐Thin Lamellae for Aberration‐Corrected Electron
    Microscopy
  title_type: original
  lang: en

## Description

- description: Aberration-corrected scanning transmission electron microscopy (STEM)
    has been advancing resolution, sensitivity, and microanalysis due to the intense
    demands of atomic-level microstructural investigations. Recent STEM technologies
    require a thin lamella whose thickness is ideally below 20 nm. Focused ion-beam/scanning-electron-microscopy
    (FIB/SEM) is a common method to prepare a high-quality lamella. However, FIB/SEM
    can hardly control the lamella thickness near 20 nm due to the lack of in-situ
    thickness quantification, which eventually limits the practical applications of
    state-of-the-art STEM technologies. Here, we demonstrate the robust preparation
    of sub-20-nm-thin lamellae by FIB/SEM with real-time feedback from thickness quantification.
    The lamella thickness is quantified by back-scattered-electron SEM imaging in
    a thickness range between 0 nm and 100 nm without referring to numerical simulation.
    Repetitive experiments show that the FIB/SEM with feedback from in-situ thickness
    quantification can prepare sub-20-nm thin lamellae with nanometer-level accuracy
    from a SrTiO3 single crystal. Aberration-corrected STEM confirms the thinness
    and quality of the prepared lamella. Moreover, we extend the preparation methodology
    to various heterostructures grown on various single-crystalline substrates, which
    cover many STEM studies. Our study provides a robust platform to prepare a thin
    lamella with accurate control of its thickness. This platform will harness state-of-the-art
    STEM technologies with many practical studies in materials science and the semiconductor
    industry.
  description_type: abstract
  lang: und

## Creator

- name: Hideyo Tsurusawa
  role: author
  orcid: https://orcid.org/0000-0001-9786-8997
- name: Jun Uzuhashi
  role: author
  orcid: https://orcid.org/0000-0003-2023-8158
- name: Yusuke Kozuka
  role: author
  orcid: https://orcid.org/0000-0001-7674-600X
- name: Koji Kimoto
  role: author
  orcid: https://orcid.org/0000-0002-3927-0492
- name: Tadakatsu Ohkubo
  role: author
  orcid: https://orcid.org/0000-0003-3548-1951

## Contact agent



## Publisher

organization: Wiley

## Managing organization



## Keyword

- subject: TEM
  schema: not_defined
- subject: FIB
  schema: not_defined
- subject: Automation
  schema: not_defined

## Rights

- identifier: https://creativecommons.org/licenses/by-nc-nd/4.0/

## Other identifier(s)



## Data origin

- data_origin_type: other

## Embargo



## Journal

- title: Small Methods
  issn: '23669608'

## Conference



## Related item



## Funding

- identifier: JPMXP1122715503
  funder_name: Ministry of Education, Culture, Sports, Science and Technology

## Instrument



## Instrument operator



## Instrument managing organization



## Measurement method



## Specimen



## Chemical composition



## Structure for specimen



## Structural feature for specimen



## Specific property for specimen



## Process for specimen treatment



## Computational method



## Energy level/transition state



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## Custom property



## Fileset

- id: 929af870-bb5f-407d-ac06-9dd18fe3ee24
  filename: Small Methods - 2024 - Tsurusawa - Robust Preparation of Sub‐20‐nm‐Thin
    Lamellae for Aberration‐Corrected Electron-1.pdf
  content_type: application/pdf
  size: 7108559
  md5: 7971d57b75e046a89d5fbcd93fe91ffb

## Thumbnail

fileset_id: 929af870-bb5f-407d-ac06-9dd18fe3ee24
filename: Small Methods - 2024 - Tsurusawa - Robust Preparation of Sub‐20‐nm‐Thin
  Lamellae for Aberration‐Corrected Electron-1.pdf