説明:
(abstract)We investigated the thickness-dependent structural evolution of Cu/FeCo(100) thin films grown by molecular beam epitaxy (MBE). At the initial stage of growth, Cu adopted a body-centered cubic (bcc) structure templated by the underlying FeCo substrate. Once the Cu thickness exceeded approximately 3 nm, a structural transformation into the face-centered cubic (fcc) phase was observed. The MBE-grown films exhibited interfacial dislocations and developed a disordered surface in the thickness range of 3-5 nm. Although metastable ultrathin bcc-Cu films on FeCo(100) grown by MBE are less stable than sputtered multilayers, MBE offers a unique advantage: it enables in-situ advanced characterization such as angle-resolved photoemission spectroscopy (ARPES) in the ultrathin regime around 1 nm. This capability is essential for designing high-performance devices and probing interface-driven electronic phenomena.
権利情報:
キーワード: Thin film, Copper, Nanostructure, Molecular beam epitaxy
刊行年月日: 2026-02-26
出版者: Surface Science Society Japan
掲載誌:
研究助成金:
原稿種別: 出版者版 (Version of record)
MDR DOI:
公開URL: https://doi.org/10.1380/ejssnt.2026-004
関連資料:
その他の識別子:
連絡先:
更新時刻: 2026-11-02 08:51:17 +0900
MDRでの公開時刻: 2026-11-02 10:32:56 +0900
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e-J SSNT 24_21(2026)_Takezawa.pdf
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サイズ | 1000KB | 詳細 |