Ryuichi Nakajima
;
Tomonori Nishimura
;
Kaito Kanahashi
;
Shogo Hatayama
;
Wen Hsin Chang
;
Yuta Saito
;
Toshifumi Irisawa
;
Keiji Ueno
;
Yasumitsu Miyata
;
Takashi Taniguchi
;
Kenji Watanabe
;
Kosuke Nagashio
説明:
(abstract)For high-performance p-type field-effect transistors (FETs) based on two-dimensional (2D) materials, the use of Pt as the contact metal, with its high work function, is advantageous for effective hole injection into the 2D channel. However, the high-energy sputtering process required to deposit Pt, due to its high melting point, often induces significant damage to the 2D materials. Recently, the achievement of nearly ideal van der Waals contacts in Sb2Te3/MoS2 via sputtering has motivated us to investigate WSe2 p-FETs with sputtered Pt electrodes. Notably, reasonable p-FET performance was observed even in monolayer WSe2. However, various characterizations revealed that the crystal structure of WSe2 was no longer preserved, suggesting the formation of a quasi-edge contact between Pt-sputtered WSe2 and the WSe2 channel. Moreover, from the perspective of sputtering applicability, the relationship between deposition methods, deposited materials, and the resulting extent of damage was systematically examined.
権利情報:
キーワード: WSe2 Contact FET
刊行年月日: 2025-09-23
出版者: American Chemical Society (ACS)
掲載誌:
研究助成金:
原稿種別: 出版者版 (Version of record)
MDR DOI:
公開URL: https://doi.org/10.1021/acsomega.5c05764
関連資料:
その他の識別子:
連絡先:
更新時刻: 2025-12-09 16:31:02 +0900
MDRでの公開時刻: 2025-12-09 16:26:08 +0900
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2025-ACSomega-Nakajima-structural-and-electric-characterization-of-sputtered-pt-wse2-contacts-toward-high-performance-2d-p-fets.pdf
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サイズ | 2.58MB | 詳細 |