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Ni-base superalloys have excellent oxidation resistance, but impurity S drastically decreases their properties. This is due to the segregation of S to the oxide/substrate interface, but direct and quantitative measurements of the interfacial strength in relation to the S segregation level have not been widely conducted. The objective of this research is to quantitatively analyze the interfacial strength between the Al2O3 layer and Ni-base substrate interfacial strength, depending on the S segregation level, using nanoindentation. Ni-9.8 wt.% Al alloys were prepared by melting the material using either an Al2O3 crucible (high Sinterface alloy) or a CaO crucible (low Sinterface alloy). Nanoindentation tests using a 60 degree pyramidal diamond indenter were conducted, and the cross-sections of both specimens exposed the (100) plane. Indentation near the interface formed cracks at the boundary between the two layers, which can be observed as pop-ins in the load-depth curves. The amount of load at the initial pop-in most likely represents the interfacial strength between the Al2O3 layer and Ni-base substrate. A Weibull analysis of results showed that suppression of the S segregation level increased the critical β scale parameter for crack formation by 650 μN. This suggests that we were able to successfully compare the effect of S segregation on the interfacial strength between the Al2O3 layer and the Ni-base substrate quantitatively.

権利情報:

• In Copyright
  

キーワード: nanoindentation, oxidation, sulfur segregation, interfacial strength, Ni-base single crystal alloy

刊行年月日: 2024-08-21

出版者: Springer Nature Switzerland

掲載誌:

• The Minerals, Metals & Materials Series (ISSN: 23671181) p. 598-605

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研究助成金:

原稿種別: 著者最終稿 (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.5226

公開URL: https://doi.org/10.1007/978-3-031-63937-1_56

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更新時刻: 2025-08-21 08:30:48 +0900

MDRでの公開時刻: 2025-08-21 08:19:16 +0900