論文 Epitaxial configuration of unidirectionally aligned MoS2 monolayer on sapphire

Akihiro Ohtake SAMURAI ORCID ; Jun Nara SAMURAI ORCID ; Yoshiki Sakuma SAMURAI ORCID

コレクション

引用
Akihiro Ohtake, Jun Nara, Yoshiki Sakuma. Epitaxial configuration of unidirectionally aligned MoS2 monolayer on sapphire. Journal of Applied Physics. 2026, 139 (2), 024303. https://doi.org/10.1063/5.0303598

説明:

(abstract)

Highly-oriented MoS2 monolayer (ML) on the sapphire(0001) substrate were grown by metal-organic chemical vapor deposition. The epitaxial configuration of ML- MoS2/sapphire has been studied using low-energy electron diffraction (LEED) combined with first-principles calculations. LEED analysis based on the dynamical diffraction theory revealed that the MoS2 ML is grown with the epitaxial relationship of MoS2 [1120] // Al2O3 [1120] and MoS2 [1100] // Al2O3 [1100], and that the formation of antiparallel (inversion) domains is effectively suppressed. The observed epitaxial relationship is insensitive to the direction of surface steps on the sapphire substrate.

権利情報:

キーワード: transition-metal dichalcogenide, low-energy electron diffraction, epitaxial growth

刊行年月日: 2026-01-14

出版者: AIP Publishing

掲載誌:

  • Journal of Applied Physics (ISSN: 00218979) vol. 139 issue. 2 024303

研究助成金:

  • Japan Society for the Promotion of Science JP23K04592
  • Core Research for Evolutional Science and Technology JPMJCR24A3

原稿種別: 出版者版 (Version of record)

MDR DOI:

公開URL: https://doi.org/10.1063/5.0303598

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更新時刻: 2026-01-14 13:07:15 +0900

MDRでの公開時刻: 2026-01-14 16:22:15 +0900

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