# Data-Driven Design of Transparent Thermal Insulating Nanoscale Layered Oxides

https://mdr.nims.go.jp/datasets/c222a45f-0984-474f-9118-a9cb989c15ca

## File

- [micromachines-14-00186.pdf](https://mdr.nims.go.jp/filesets/bf8cec5a-1805-48b9-81c7-02a524097369/download) ([Detail](https://mdr.nims.go.jp/filesets/bf8cec5a-1805-48b9-81c7-02a524097369.md))

## Id

c222a45f-0984-474f-9118-a9cb989c15ca

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2023-02-09T05:29:42.264785Z

## Updated at

2024-05-07T00:57:13.116288Z

## Published at

2023-02-13T00:18:52.503277Z

## Doi



## First published url

https://doi.org/10.3390/mi14010186

## Date published

2023-01-11

## Recorded date published



## Resource type

journal_article

## Manuscript type

vor

## Collection



## Title

- title: Data-Driven Design of Transparent Thermal Insulating Nanoscale Layered Oxides
  title_type: original
  lang: en

## Description

- description: "Predicting the interfacial thermal resistance (ITR) for various material
    systems is a time-consuming process. In this study, we applied our previously
    proposed ITR machine learning models to discover the material systems that satisfy
    both high transparency and low thermal conductivity. The selected material system
    of TiO2/SiO2 shows a high ITR of 26.56 m2K/GW, which is in good\r\nagreement with
    the predicted value. The nanoscale layered TiO2/SiO2 thin films synthesized by\r\nsputtering
    exhibits ultralow thermal conductivity (0.21 W/mK) and high transparency (>90%,
    380–\r\n800 nm). The reduction of the thermal conductivity is achieved by the
    high density of the interfaces\r\nwith a high ITR rather than the change of the
    intrinsic thermal conductivity. The thermal conductivity of TiO2 is observed to
    be 1.56 W/mK with the film thickness in the range of 5 – 50 nm. Furthermore, the
    strong substrate dependence is confirmed as the thermal conductivity of the nanoscale\r\nlayered
    TiO2/SiO2 thin films on quartz glass is three times lower than that on Si. The
    proposed\r\nTiO2/SiO2 composites have higher transparency and robustness, good
    adaptivity to electronics, and\r\nlower cost than the current transparent thermal
    insulating materials such as aerogels and polypropylene. The good agreement of
    the experimental ITR with the prediction and the low thermal conductivity of the
    layered thin films promise this strategy has great potential for accelerating
    the development of transparent thermal insulators."
  description_type: abstract
  lang: eng

## Creator

- name: Yen-Ju Wu
  role: author
  orcid: https://orcid.org/0000-0003-2647-3407
  organization: National Institute for Materials Science
  ror: https://ror.org/026v1ze26
- name: Yibin Xu
  role: author
  orcid: https://orcid.org/0000-0001-8600-8748
  organization: National Institute for Materials Science
  ror: https://ror.org/026v1ze26

## Contact agent



## Publisher

organization: MDPI AG

## Managing organization



## Keyword

- subject: thermal conductivity; thermal insulator; thin film; superlattice; transparency
  schema: not_defined

## Rights



## Other identifier(s)



## Data origin

- data_origin_type: other

## Embargo



## Journal

- title: Micromachines
  issn: 2072666X
  volume: '14'
  issue: '1'
  start_page: 186
  end_page: 186

## Conference



## Related item



## Funding

- identifier: CREST Grant Number JPMJCR21O2
  funder_name: 'Japan Science and Technology Agency (JST) '

## Instrument



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## Fileset

- id: bf8cec5a-1805-48b9-81c7-02a524097369
  filename: micromachines-14-00186.pdf
  content_type: application/pdf
  size: 3113882
  md5: 95900ce55ae06590cf53ef137ea8d433

## Thumbnail

fileset_id: bf8cec5a-1805-48b9-81c7-02a524097369
filename: micromachines-14-00186.pdf