@article{che,
  title = {Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1−                    <i>x</i>                    Zr                    <i>x</i>                    O2 thin films},
  author = {Haoming Che, Takashi Onaya, Atsushi Tamura, Masaki Ishii, Hiroshi Taka, Koji Kita},
  publisher = {American Vacuum Society},
  year = {2026},
  keywords = {atomic layer deposition, ferroelectric HfO2-based thin films, oxidant, low temperature fabrication process}
}