# Tuning Interfacial Thermal and Electrical Conductance across a Metal/MoS2 Monolayer through N‐Methyl‐2‐pyrrolidone Wet Cleaning

https://mdr.nims.go.jp/datasets/b06821a7-8def-4834-b901-a74b467eaa27

## File

- [AMI_MoS2.pdf](https://mdr.nims.go.jp/filesets/891e2e02-c3c1-4470-bdfc-8eabb67cb199/download) ([Detail](https://mdr.nims.go.jp/filesets/891e2e02-c3c1-4470-bdfc-8eabb67cb199.md))

## Id

b06821a7-8def-4834-b901-a74b467eaa27

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2023-03-13T07:53:30.907026Z

## Updated at

2024-01-05T13:13:08.589462Z

## Published at

2023-03-22T02:24:34.582848Z

## Doi



## First published url

https://doi.org/10.1002/admi.202000364

## Date published

2020-05-27

## Recorded date published

2020-7

## Resource type

journal_article

## Manuscript type

vor

## Collection



## Title

- title: Tuning Interfacial Thermal and Electrical Conductance across a Metal/MoS2
    Monolayer through N‐Methyl‐2‐pyrrolidone Wet Cleaning
  title_type: original
  lang: en

## Description

- description: Extensive effort has been dedicated to developing two-dimensional (2D)
    materials as an alternative to Si-based semiconductor technology. As the size
    decreases, heat dissipation at various interfaces becomes increasingly important
    in controlling device performance. On the other hand, the high interfacial thermal
    resistances can be applied for thermoelectric devices or thermal insulators by
    achieving ultra-low thermal conductivity via nanostructuring. Here, we found that
    (a) the thermal and electrical conductance of the Au/MoS2 monolayer interface
    can be tuned by changing the interfacial chemical properties through N-methyl-2-pyrrolidone
    (NMP) wet cleaning while preserving the MoS2 structure; (b) The effectiveness
    of the NMP cleaning process, which removes surface adsorbates, exhibits a temperature
    dependence; (c) Experimental results demonstrate that adequate oxygen adsorbates
    at the Au/MoS2 interface significantly improve the thermal and electrical conductance,
    in agreement with the simulation results. The interfacial thermal conductance
    increases by 339.87% when oxygen adsorbates partially removed and decreases by
    74.37% as a sharp interface exists (oxygen adsorbates removed) compared to as-deposit
    interfaces. The electrical conductance shows up to two-order increase after NMP
    cleaning. This finding can both enhance the heat dissipation in functional devices
    and provide new options for the interface design of thermal insulating thin films.
  description_type: abstract
  lang: eng

## Creator

- name: Yen‐Ju Wu
  role: author
  orcid: https://orcid.org/0000-0003-2647-3407
  organization: National Institute for Materials Science
  ror: https://ror.org/026v1ze26
- name: Yann‐Wen Lan
  role: author
- name: Shih‐Chieh Hsu
  role: author
- name: Chen‐Hao Yeh
  role: author
- name: Yu‐Seng Ku
  role: author
- name: Jyh‐Chiang Jiang
  role: author
- name: Yibin Xu
  role: author
  orcid: https://orcid.org/0000-0001-8600-8748
  organization: National Institute for Materials Science
  ror: https://ror.org/026v1ze26

## Contact agent



## Publisher

organization: Wiley

## Managing organization



## Keyword

- subject: electrical conductance, interfacial thermal resistances, molybdenum disulfide,
    monolayers, wet cleaning
  schema: not_defined

## Rights

- identifier: https://creativecommons.org/licenses/by/4.0/

## Other identifier(s)



## Data origin



## Embargo



## Journal

- title: Advanced Materials Interfaces
  issn: '21967350'
  volume: '7'
  issue: '14'
  start_page: 2000364
  end_page: 2000364

## Conference



## Related item



## Funding

- identifier: " ‘Materials research by Information Integration’ Initiative (MI2I)
    project"
  funder_name: Japan Science and Technology Agency (JST)
  description: " ‘Materials research by Information Integration’ Initiative (MI2I)
    project\r\nof the Support Program for Starting Up Innovation Hub from\r\nJapan
    Science and Technology Agency (JST)"

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## Specimen



## Chemical composition



## Structure for specimen



## Structural feature for specimen



## Specific property for specimen



## Process for specimen treatment



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## Fileset

- id: 891e2e02-c3c1-4470-bdfc-8eabb67cb199
  filename: AMI_MoS2.pdf
  content_type: application/pdf
  size: 3561455
  md5: 549b0252e057bb399da344f81b47fe18

## Thumbnail

fileset_id: 891e2e02-c3c1-4470-bdfc-8eabb67cb199
filename: AMI_MoS2.pdf