@article{oshima,
  title = {HCl-based halide vapor phase epitaxy and selective-area HCl gas etching of (−112) β-Ga
                    <sub>2</sub>
                    O
                    <sub>3</sub>},
  author = {Takayoshi Oshima, Yuichi Oshima},
  publisher = {Informa UK Limited},
  year = {2026},
  keywords = {Ga2O3, (−112), HVPE, HCl gas etching}
}