ジャーナル論文 Wafer-scale AA-stacked hexagonal boron nitride grown on a GaN substrate
Seokho Moon (author) (この著者で検索)
;
Odongo Francis Ngome Okello (author) (この著者で検索)
;
Adrien Rousseau (author) (この著者で検索)
;
Chang-Won Choi (author) (この著者で検索)
;
Youngjae Kim (author) (この著者で検索)
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Yunjae Park (author) (この著者で検索)
;
Jiye Kim (author) (この著者で検索)
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Jaewon Kim (author) (この著者で検索)
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Minhyuk Kim (author) (この著者で検索)
;
Pierre Valvin (author) (この著者で検索)
;
Jaehee Cho (author) (この著者で検索)
;
Kenji Watanabe (author) (この著者で検索)
ORCID SAMURAI ;
Takashi Taniguchi (author) (この著者で検索)
ORCID SAMURAI ;
Hu Young Jeong (author) (この著者で検索)
;
Giorgia Fugallo (author) (この著者で検索)
;
Wilfried Desrat (author) (この著者で検索)
;
Feng Ding (author) (この著者で検索)
;
JaeDong Lee (author) (この著者で検索)
;
Bernard Gil (author) (この著者で検索)
;
Guillaume Cassabois (author) (この著者で検索)
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Si-Young Choi (author) (この著者で検索)
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Jong Kyu Kim (author) (この著者で検索)
コレクション

引用
Seokho Moon, Odongo Francis Ngome Okello, Adrien Rousseau, Chang-Won Choi, Youngjae Kim, Yunjae Park, Jiye Kim, Jaewon Kim, Minhyuk Kim, Pierre Valvin, Jaehee Cho, Kenji Watanabe, Takashi Taniguchi, Hu Young Jeong, Giorgia Fugallo, Wilfried Desrat, Feng Ding, JaeDong Lee, Bernard Gil, Guillaume Cassabois, Si-Young Choi, Jong Kyu Kim. Wafer-scale AA-stacked hexagonal boron nitride grown on a GaN substrate. Nature Materials. 2025, 24 (6), 843-851. https://doi.org/10.1038/s41563-025-02173-2

説明:

(abstract)

The stacking sequence of two-dimensional hexagonal boron nitride (hBN) is a critical factor that determines its polytypes and its distinct physical properties. Although most hBN layers adopt the thermodynamically stable AA′ stacking sequence, achieving alternative stacking configurations has remained a long-standing challenge. Here we demonstrate the scalable synthesis of hBN featuring unprecedented AA stacking, where atomic monolayers align along the c axis without any translation or rotation. This previously considered thermodynamically unfavourable hBN polytype is achieved through epitaxial growth on a two-inch single-crystalline gallium nitride wafer, using a metal–organic chemical vapour deposition technique. Comprehensive structural and optical characterizations, complemented by theoretical modelling, evidence the formation of AA-stacked multilayer hBN and reveal that hBN nucleation on the vicinal gallium nitride surface drives the unidirectional alignment of layers. Here electron doping plays a central role in stabilizing the AA stacking configuration. Our findings provide further insights into the scalable synthesis of engineered hBN polytypes, characterized by unique properties such as large optical nonlinearity.

権利情報:

  • In Copyright

    This version of the article has been accepted for publication, after peer review (when applicable) and is subject to Springer Nature’s AM terms of use, but is not the Version of Record and does not reflect post-acceptance improvements, or any corrections. The Version of Record is available online at: https://doi.org/10.1038/s41563-025-02173-2

キーワード: Hexagonal boron nitride (hBN), Stacking sequence (polytype), Metal-organic chemical vapor deposition (MOCVD)

刊行年月日: 2025-03-19

出版者: Springer Science and Business Media LLC

掲載誌:

  • Nature Materials (ISSN: 14764660) vol. 24 issue. 6 p. 843-851

研究助成金:

  • National Research Foundation of Korea NRF-2021M3C1C3097673
  • National Research Foundation of Korea RS-2024-00344690
  • National Research Foundation of Korea RS-2022-NR068223
  • National Research Foundation of Korea NRF-2021M3C1C3097673
  • National Research Foundation of Korea 2018H1A2A1060392
  • National Research Foundation of Korea RS-2024-00344690
  • National Research Foundation of Korea RS-2022-NR068223
  • National Research Foundation of Korea RS-2024-00355591
  • National Research Foundation of Korea RS-2024-00355591
  • Ministry of Trade, Industry and Energy 20016290
  • Ministry of Trade, Industry and Energy 20016290
  • Electronics and Telecommunications Research Institute 25YH1100
  • Electronics and Telecommunications Research Institute 25YH1100
  • Samsung SRFC-MA1401-10
  • Samsung IO201215-08185-01
  • Samsung SRFC-MA1401-10
  • Samsung IO201215-08185-01
  • Samsung SRFC-MA1401-10
  • Samsung IO201215-08185-01
  • Samsung SRFC-MA1401-10
  • Samsung IO201215-08185-01
  • Korea Basic Science Institute 2020R1A6C101A202
  • Korea Basic Science Institute 2020R1A6C101A202
  • Korea Basic Science Institute 2020R1A6C101A202

原稿種別: 著者最終稿 (Accepted manuscript)

MDR DOI:

公開URL: https://doi.org/10.1038/s41563-025-02173-2

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更新時刻: 2026-08-31 14:53:07 +0900

MDRでの公開時刻: 2026-08-31 16:27:56 +0900

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