Shuai Tang
;
Jie Tang
;
Yimeng Wu
;
You-Hu Chen
;
Jun Uzuhashi
;
Tadakatsu Ohkubo
;
Masaki Takeguchi
;
Lu-Chang Qin
説明:
(abstract)HfC nanoneedles with both excellent electron emission characteristics and robust structure are promising field-emission point electron sources, especially for applications desiring a high emission current. Herewith we report successful fabrication of HfC nanoneedle emitter by focused ion beam and its characterization. Transmission electron microscopy and energy dispersive X-ray spectroscopy examinations show that the HfC nanoneedle has a sharp tip with a radius of curvature of about 10 nm. Its atomic structure remains crystalline and it is aligned in a <100> direction. The HfC nanoneedle emitter has a low work function of 3.2 eV. It delivers an electron beam with a low turn-on field of 2.7 V/nm (at emission current of 2 nA) and a threshold field of 3.5 V/nm (at emission current of 50 nA), respectively. The HfC nanoneedle emitter also exhibits an excellent emission stability with a fluctuation of 1.5 % in 15 min under a high current (280 nA). The excellent current stability is attributed to the sharp tip lowering the extraction voltage that reduced ion bombardment and oxidation of the emitter surface with lowered activities in gas adsorption or desorption.
権利情報:
キーワード: electron emission, transmission electron microscopy, focused ion beam
刊行年月日: 2025-03-06
出版者: Elsevier BV
掲載誌:
研究助成金:
原稿種別: 査読前原稿 (Author's original)
MDR DOI: https://doi.org/10.48505/nims.5417
公開URL: https://doi.org/10.1016/j.vacuum.2025.114224
関連資料:
その他の識別子:
連絡先:
更新時刻: 2025-04-12 08:30:10 +0900
MDRでの公開時刻: 2025-04-11 20:23:09 +0900
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Stable and high current emission of electrons from a HfC nanoneedle field-emitter fabricated by focused ion beam.pdf
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