# Experimental investigation and simulation of SEM image intensity behaviors for developing thickness-controlled S/TEM lamella preparation via FIB-SEM

https://mdr.nims.go.jp/datasets/a4143d20-b2de-4538-91bf-5d9f5a8af1f2

## File

- [Experimental investigation and simulation of SEM image intensity behaviors for developing thickness-controlled STEM lamella preparation via FIB-SEM.pdf](https://mdr.nims.go.jp/filesets/4091913d-46c0-41b8-a718-748b5cf9e0d0/download) ([Detail](https://mdr.nims.go.jp/filesets/4091913d-46c0-41b8-a718-748b5cf9e0d0.md))

## Id

a4143d20-b2de-4538-91bf-5d9f5a8af1f2

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2025-04-03T05:31:53.115514Z

## Updated at

2026-01-31T07:30:04.112395Z

## Published at

2026-01-31T04:13:55.673870Z

## Doi

https://doi.org/10.48505/nims.5407

## First published url

https://doi.org/10.1093/jmicro/dfaf006

## Date published

2025-08-01

## Recorded date published

2025-8-1

## Resource type

journal_article

## Manuscript type

accepted_manuscript

## Collection



## Title

- title: Experimental investigation and simulation of SEM image intensity behaviors
    for developing thickness-controlled S/TEM lamella preparation via FIB-SEM
  title_type: original
  lang: en

## Description

- description: 'High-quality thin lamellae are essential for state‐of‐the‐art scanning
    transmission electron microscopy (S/TEM) analyses. While the preparation of S/TEM
    lamellae using focused ion beam (FIB-) scanning electron microscopy (SEM) has
    been established since the early 21st century, two critical factors have only
    recently been addressed: precise control over lamella thickness and a systematic
    understanding of FIB-induced damage. This study conducts an experimental investigation
    and simulation to explore how the intensities of backscattered and secondary electrons
    (BSEs and SEs, respectively) depend on lamellae thickness for semiconductor (Si),
    insulator (Al2O3), and metallic (stainless-steel) materials. The BSE intensity
    shows a simple linear relationship with the lamella thickness for all materials
    below a certain thickness, whereas the relationship between the SE intensity and
    thickness is more complex. In conclusion, the BSE intensity is a reliable indicator
    for accurately determining lamella thickness across various materials during FIB
    thinning processing, while the SE intensity lacks consistency due to material
    and detector variability. This insight enables the integration of real-time thickness
    control into S/TEM lamella preparation, significantly enhancing lamella quality
    and reproducibility. These findings pave the way for more efficient, automated
    processes in high-quality S/TEM analysis, making the preparation method more reliable
    for a range of applications.'
  description_type: abstract
  lang: und

## Creator

- name: Jun Uzuhashi
  role: author
  orcid: https://orcid.org/0000-0003-2023-8158
- name: Yuanzhao Yao
  role: author
- name: Tadakatsu Ohkubo
  role: author
  orcid: https://orcid.org/0000-0003-3548-1951
- name: Takashi Sekiguchi
  role: author

## Contact agent



## Publisher

organization: Oxford University Press (OUP)

## Managing organization



## Keyword

- subject: transmission electron microscopy
  schema: not_defined
- subject: scanning electron microscopy
  schema: not_defined
- subject: focused ion beam
  schema: not_defined

## Rights

- description: This is a pre-copyedited, author-produced version of an article accepted
    for publication in Microscopy following peer review. The version of record Jun
    Uzuhashi, Yuanzhao Yao, Tadakatsu Ohkubo, Takashi Sekiguchi, Experimental investigation
    and simulation of SEM image intensity behaviors for developing thickness-controlled
    S/TEM lamella preparation via FIB-SEM, Microscopy, 2025;, dfaf006 is available
    online at:https://doi.org/10.1093/jmicro/dfaf006.
  identifier: http://rightsstatements.org/vocab/InC/1.0/

## Other identifier(s)



## Data origin

- data_origin_type: other

## Embargo

start_date: 2025-01-31
end_date: 2026-01-31

## Journal

- title: Microscopy
  issn: '20505698'

## Conference



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## Instrument



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## Measurement method



## Specimen



## Chemical composition



## Structure for specimen



## Structural feature for specimen



## Specific property for specimen



## Process for specimen treatment



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## Fileset

- id: 4091913d-46c0-41b8-a718-748b5cf9e0d0
  filename: Experimental investigation and simulation of SEM image intensity behaviors
    for developing thickness-controlled STEM lamella preparation via FIB-SEM.pdf
  content_type: application/pdf
  size: 2560637
  md5: 261e988df4206e809072612d24274b55

## Thumbnail

fileset_id: 4091913d-46c0-41b8-a718-748b5cf9e0d0
filename: Experimental investigation and simulation of SEM image intensity behaviors
  for developing thickness-controlled STEM lamella preparation via FIB-SEM.pdf