@article{onaya,
  title = {Interface engineering of HfO                    <sub>2</sub>                    -based ferroelectric devices for crystal phase control and enhanced ferroelectricity using atomic-layer-deposited ZrO                    <sub>2</sub>                    nucleation layers},
  author = {Takashi Onaya, Toshihide Nabatame},
  publisher = {IOP Publishing},
  year = {2026},
  keywords = {atomic layer deposition, ferroelectric HfO2-based thin films, memory devices, interface engineering, crystal phase control}
}