# Engineering high quality graphene superlattices via ion milled ultra-thin etching masks

https://mdr.nims.go.jp/datasets/891c03fc-4ab8-4edd-88bd-8c9a41681ac5

## File

- [s41467-022-34734-3.pdf](https://mdr.nims.go.jp/filesets/51a7cc63-0d3f-4f09-abda-c10ad39a802d/download) ([Detail](https://mdr.nims.go.jp/filesets/51a7cc63-0d3f-4f09-abda-c10ad39a802d.md))

## Id

891c03fc-4ab8-4edd-88bd-8c9a41681ac5

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2025-02-26T08:09:20.514361Z

## Updated at

2025-02-27T07:30:42.600491Z

## Published at

2025-02-27T07:30:42.719817Z

## Doi



## First published url

https://doi.org/10.1038/s41467-022-34734-3

## Date published

2022-11-14

## Recorded date published



## Resource type

journal_article

## Manuscript type

vor

## Collection



## Title

- title: Engineering high quality graphene superlattices via ion milled ultra-thin
    etching masks
  title_type: original
  lang: en

## Description

- description: Nanofabrication research pursues the miniaturization of patterned feature
    size. In the current state of the art, micron scale areas can be patterned with
    features down to ~ 30 nm pitch using electron beam lithography. Our work demonstrates
    a new nanofabrication technique which allows patterning periodic structures with
    a pitch down to 16 nm. It is based on focused ion beam milling of suspended membranes,
    with minimal proximity effects typical to electron beam lithography. The membranes
    are then transferred and used as hard etching masks. We benchmark our technique
    by engineering a superlattice potential in single layer graphene using a thin
    graphite patterned gate electrode. Our electronic transport characterization shows
    high quality superlattice properties and a rich Hofstadter butterfly spectrum.
    Our technique opens the path towards the realization of very short period superlattices
    in 2D materials, comparable to those in natural moiré systems, but with the ability
    to control lattice symmetries and strength. This can pave the way for a versatile
    solid-state quantum simulator platform and the study of correlated electron phases.
  description_type: abstract
  lang: und

## Creator

- name: David Barcons Ruiz
  role: author
- name: Hanan Herzig Sheinfux
  role: author
- name: Rebecca Hoffmann
  role: author
- name: Iacopo Torre
  role: author
- name: Hitesh Agarwal
  role: author
- name: Roshan Krishna Kumar
  role: author
- name: Lorenzo Vistoli
  role: author
- name: Takashi Taniguchi
  role: author
  orcid: https://orcid.org/0000-0002-1467-3105
  organization: National Institute for Materials Science
- name: Kenji Watanabe
  role: author
  orcid: https://orcid.org/0000-0003-3701-8119
  organization: National Institute for Materials Science
- name: Adrian Bachtold
  role: author
- name: Frank H. L. Koppens
  role: author

## Contact agent



## Publisher

organization: Springer Science and Business Media LLC

## Managing organization



## Keyword

- subject: Nanofabrication
  schema: not_defined
- subject: electron beam lithography
  schema: not_defined
- subject: superlattice potential
  schema: not_defined

## Rights

- identifier: https://creativecommons.org/licenses/by/4.0/

## Other identifier(s)



## Data origin

- data_origin_type: other

## Embargo



## Journal

- title: Nature Communications
  issn: '20411723'
  volume: '13'
  article_number: '6926'

## Conference



## Related item



## Funding



## Instrument



## Instrument operator



## Instrument managing organization



## Measurement method



## Specimen



## Chemical composition



## Structure for specimen



## Structural feature for specimen



## Specific property for specimen



## Process for specimen treatment



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## Fileset

- id: 51a7cc63-0d3f-4f09-abda-c10ad39a802d
  filename: s41467-022-34734-3.pdf
  content_type: application/pdf
  size: 1763518
  md5: 9e4d573c602b5e0248a53710ce20a37d

## Thumbnail

fileset_id: 51a7cc63-0d3f-4f09-abda-c10ad39a802d
filename: s41467-022-34734-3.pdf