論文 Modified galvanic replacement using ethanol vapor-assisted vacuum ultraviolet (E-VUV) for enhanced Ag deposition

Shubhayan Mukherjee ; Akitsu Shigetou SAMURAI ORCID (National Institute for Materials Science) ; Yu-Hao Chou ; Shih-Kang Lin

コレクション

引用
Shubhayan Mukherjee, Akitsu Shigetou, Yu-Hao Chou, Shih-Kang Lin. Modified galvanic replacement using ethanol vapor-assisted vacuum ultraviolet (E-VUV) for enhanced Ag deposition. Materials Letters. 2025, 403 (), 139482. https://doi.org/10.1016/j.matlet.2025.139482

説明:

(abstract)

To enhance the Ag coverage on the Cu surface in the galvanic replacement (GR) method, a two-step surface treatment was developed using Ar fast atom beam (Ar-FAB) bombardment followed by ethanol vapor-assisted vacuum ultraviolet (E-VUV) irradiation. Ar-FAB removed the native oxide from Cu, and E-VUV formed a protective layer that prevents Cu reoxidation in air and dissolves readily in AgNO3 solution. Compared to the traditional GR method with acid etching, X-ray photoelectron spectroscopy (XPS) analyses showed an increased spectrum intensity in Ag 3d and a decrease in Cu-O and –OH, indicating better coverage of the Ag layer on the Cu surface. The Ag layer thickness grew by about 7 nm during immersion from 10 to 300 s, while the traditional GR film stopped growing after 60 s. Scanning electron microscopy (SEM) revealed minimal growth of large Ag dendrites.

権利情報:

キーワード: galvanic replacement, vapor-assisted vacuum ultraviolet, Ag deposition

刊行年月日: 2025-09-08

出版者: Elsevier BV

掲載誌:

  • Materials Letters (ISSN: 0167577X) vol. 403 139482

研究助成金:

原稿種別: 出版者版 (Version of record)

MDR DOI:

公開URL: https://doi.org/10.1016/j.matlet.2025.139482

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更新時刻: 2026-01-14 10:32:49 +0900

MDRでの公開時刻: 2026-01-14 12:20:12 +0900

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