Shubhayan Mukherjee
;
Akitsu Shigetou
(National Institute for Materials Science)
;
Yu-Hao Chou
;
Shih-Kang Lin
説明:
(abstract)To enhance the Ag coverage on the Cu surface in the galvanic replacement (GR) method, a two-step surface treatment was developed using Ar fast atom beam (Ar-FAB) bombardment followed by ethanol vapor-assisted vacuum ultraviolet (E-VUV) irradiation. Ar-FAB removed the native oxide from Cu, and E-VUV formed a protective layer that prevents Cu reoxidation in air and dissolves readily in AgNO3 solution. Compared to the traditional GR method with acid etching, X-ray photoelectron spectroscopy (XPS) analyses showed an increased spectrum intensity in Ag 3d and a decrease in Cu-O and –OH, indicating better coverage of the Ag layer on the Cu surface. The Ag layer thickness grew by about 7 nm during immersion from 10 to 300 s, while the traditional GR film stopped growing after 60 s. Scanning electron microscopy (SEM) revealed minimal growth of large Ag dendrites.
権利情報:
キーワード: galvanic replacement, vapor-assisted vacuum ultraviolet, Ag deposition
刊行年月日: 2025-09-08
出版者: Elsevier BV
掲載誌:
研究助成金:
原稿種別: 出版者版 (Version of record)
MDR DOI:
公開URL: https://doi.org/10.1016/j.matlet.2025.139482
関連資料:
その他の識別子:
連絡先:
更新時刻: 2026-01-14 10:32:49 +0900
MDRでの公開時刻: 2026-01-14 12:20:12 +0900
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