Article Fast electron damage mechanism of epoxy resin studied by electron energy loss spectroscopy and electron diffraction

Jun Kikkawa SAMURAI ORCID (National Institute for Materials Science) ; Aoi Nii ; Yoshiaki Sakaniwa ; Naochika Kon ; Marina Sakamaki ; Touyou Ohashi ; Nobuyasu Nita ; Koji Harano SAMURAI ORCID (National Institute for Materials Science) ; Koji Kimoto SAMURAI ORCID (National Institute for Materials Science)

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Citation
Jun Kikkawa, Aoi Nii, Yoshiaki Sakaniwa, Naochika Kon, Marina Sakamaki, Touyou Ohashi, Nobuyasu Nita, Koji Harano, Koji Kimoto. Fast electron damage mechanism of epoxy resin studied by electron energy loss spectroscopy and electron diffraction. JOURNAL OF CHEMICAL PHYSICS. 2023, 159 (17), 174708-174708. https://doi.org/10.48505/nims.4276
SAMURAI

Description:

(abstract)

The damage mechanism and exposure tolerance of epoxy resins to fast electrons remain unclear. We quantitatively investigated the effects of electron irradiation on a common epoxy resin by dose-dependent electron energy loss spectroscopy (EELS). The results show that sp3 states of nitrogen, oxygen, and their adjacent carbon atoms were converted to sp2 states, forming imine (C=N) and carbonyl (C=O) as the total electron dose increased. The sp3 to sp2 conversion mechanism was proposed. The epoxy resin was very sensitive to fast electrons and the original electronic states were maintained up to a total dose of ~10^3 e− nm−2 at a low temperature of 103 K. Dose-dependent electron diffraction (ED) revealed that the intra- and intermolecular geometries changed below and around the total dose of ~10^3 e− nm−2.

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  • In Copyright
    This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in The Journal of Chemical Physics Volume 159, Issue 17,174708 and may be found at https://doi.org/10.1063/5.0177019.

Keyword: epoxy resin, electron energy loss spectroscopy, fast electron damage, π electron

Date published: 2023-11-07

Publisher: AIP Publishing

Journal:

  • JOURNAL OF CHEMICAL PHYSICS (ISSN: 00219606) vol. 159 issue. 17 p. 174708-174708

Funding:

Manuscript type: Author's version (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.4276

First published URL: https://doi.org/10.1063/5.0177019

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Updated at: 2024-01-05 22:12:30 +0900

Published on MDR: 2023-12-01 13:30:25 +0900

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