ジャーナル論文 Effect of accelerating voltages on indexing of SEM-EBSD via pattern matching
ORCID SAMURAI ; ORCID SAMURAI
コレクション

引用
Tomotaka Hatakeyama, Kota Sawada. Effect of accelerating voltages on indexing of SEM-EBSD via pattern matching. Ultramicroscopy. 2026, 284 (), 114387. https://doi.org/10.1016/j.ultramic.2026.114387

説明:

(abstract)

The influence of the accelerating voltage on the spatial resolution and phase indexing accuracy of electron backscattered diffraction (SEM-EBSD) was systematically investigated using austenitic heat-resistant steel. Both traditional Hough transformation and novel Spherical Indexing methods were employed to analyze the kernel average misorientation (KAM) and indexing of fine M23C6 precipitates. It was confirmed that lower accelerating voltages reduce the interaction volume, thereby improving the spatial resolution. Spherical Indexing provided enhanced accuracy in detecting local misorientations, especially in the creep-ruptured material. While the effect of the accelerating voltage on KAM was minimal, it became significant when indexing fine precipitates. At 10 kV, precipitates as small as 50 nm on the Σ3 boundaries could be indexed, whereas precipitates of 200 nm at 15 kV and 300 nm at 25 kV were required for reliable identification. These results demonstrate the critical role of measurement conditions in advanced EBSD microstructural characterization and suggest the effectiveness of Spherical Indexing for high-resolution evaluation of creep damage and phase separation of nanoscale features.

権利情報:

キーワード: EBSD, Pattern matching, Spherical indexing, Accelerating voltage, Spatial resolution

刊行年月日: 2026-05-16

出版者: Elsevier BV

掲載誌:

  • Ultramicroscopy (ISSN: 03043991) vol. 284 114387

研究助成金:

  • Japan Society for the Promotion of Science

原稿種別: 出版者版 (Version of record)

MDR DOI:

公開URL: https://doi.org/10.1016/j.ultramic.2026.114387

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更新時刻: 2026-05-25 11:28:35 +0900

MDRでの公開時刻: 2026-05-25 12:30:05 +0900

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