@misc{yusuke2026a,
  title = {Reference-Free Quantitative Mass Spectrometry Enables Sequencing of Resist Copolymers and Reveals Sequence-Dependent Deprotection Sensitivity},
  author = {Yusuke Hibi, Yasuyuki Nakamura, Shiho Uesaka, Masanobu Naito},
  publisher = {American Chemical Society (ACS)},
  year = {2026-02-10},
  keywords = {polymer sequencing, monomer sequence analysis, pyrolysis mass spectrometry, photoresist, non-negative matrix factorization, reference-free quantitative mass spectrometry}
}