# Estimation of valence state and growth rate using principal component analysis of plasma emission in reactive sputtering deposition

https://mdr.nims.go.jp/datasets/57dea07d-6ef9-4877-b490-9af0806ab49c

## File

- [Minami_20250723final_w_highlight.pdf](https://mdr.nims.go.jp/filesets/bfbaecaa-3305-40d2-b2d5-9d43eaee1686/download) ([Detail](https://mdr.nims.go.jp/filesets/bfbaecaa-3305-40d2-b2d5-9d43eaee1686.md))
- [STAM-Methods 2025-0029_data.zip](https://mdr.nims.go.jp/filesets/2ebfc41d-f119-4d04-ad06-47d3a9f1878f/download) ([Detail](https://mdr.nims.go.jp/filesets/2ebfc41d-f119-4d04-ad06-47d3a9f1878f.md))

## Id

57dea07d-6ef9-4877-b490-9af0806ab49c

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2025-09-09T01:15:56.054863Z

## Updated at

2025-09-10T07:30:38.362830Z

## Published at

2025-09-10T07:19:31.248264Z

## Doi

https://doi.org/10.48505/nims.5750

## First published url

https://doi.org/10.1080/27660400.2025.2544523

## Date published

2025-12-31

## Recorded date published

2025-12-31

## Resource type

journal_article

## Manuscript type

accepted_manuscript

## Collection



## Title

- title: Estimation of valence state and growth rate using principal component analysis
    of plasma emission in reactive sputtering deposition
  title_type: original
  lang: en

## Description

- description: Reactive sputtering is a complex process in which the valence state
    of the deposited material and the deposition rate are highly sensitive to growth
    conditions. Reliable monitoring is essential for achieving reproducible and high-quality
    thin film growth; however, practical methods remain limited. In this study, we
    developed a real-time analysis method that combines broad-range plasma emission
    spectroscopy with principal component analysis (PCA). The results demonstrate
    that the valence state and deposition rate of iron oxide thin films can be accurately
    predicted using the first and second principal components. This approach offers
    a promising tool for real-time prediction and control of the deposition process.
  description_type: abstract
  lang: en

## Creator

- name: Rintaro Minami
  role: author
  organization: University of Tsukuba
  department: a Department of Applied Physics
- name: Eiji Kita
  role: author
- name: Chiharu Mitsumata
  role: author
- name: Hideto Yanagihara
  role: author

## Contact agent



## Publisher

organization: Taylor & Francis

## Managing organization



## Keyword

- subject: Machine learning
  schema: not_defined
- subject: principal component analysis (PCA)
  schema: not_defined
- subject: reactive magnetron sputtering
  schema: not_defined
- subject: plasma emission spectrum
  schema: not_defined
- subject: Mössbauer spectroscopy
  schema: not_defined

## Rights

- identifier: https://creativecommons.org/licenses/by/4.0/

## Other identifier(s)



## Data origin

- data_origin_type: other

## Embargo



## Journal

- title: Science and Technology of Advanced Materials
  issn: '27660400'
  volume: '5'
  issue: '1'
  article_number: '2544523'

## Conference



## Related item



## Funding



## Instrument



## Instrument operator



## Instrument managing organization



## Measurement method



## Specimen



## Chemical composition



## Structure for specimen



## Structural feature for specimen



## Specific property for specimen



## Process for specimen treatment



## Computational method



## Energy level/transition state



## Software



## Custom property



## Fileset

- id: bfbaecaa-3305-40d2-b2d5-9d43eaee1686
  filename: Minami_20250723final_w_highlight.pdf
  content_type: application/pdf
  size: 4695627
  md5: 1258b86a1280c69bdec5f290048a1ae8
- id: 2ebfc41d-f119-4d04-ad06-47d3a9f1878f
  filename: STAM-Methods 2025-0029_data.zip
  content_type: application/zip
  size: 622646
  md5: 4cf75e7200164d28198f69034c613cfa

## Thumbnail

fileset_id: bfbaecaa-3305-40d2-b2d5-9d43eaee1686
filename: Minami_20250723final_w_highlight.pdf