# Interfacial thermal resistance of metal-nonmetal interfaces under bidirectional heat fluxes

https://mdr.nims.go.jp/datasets/568acd2e-3ac5-42a8-8603-4e75b9d7ddab

## File

- [manuscript_revised_final.docx](https://mdr.nims.go.jp/filesets/41466b20-3b0d-4423-8a55-eb9807101d8c/download) ([Detail](https://mdr.nims.go.jp/filesets/41466b20-3b0d-4423-8a55-eb9807101d8c.md))

## Id

568acd2e-3ac5-42a8-8603-4e75b9d7ddab

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2024-11-14T00:40:31.542372Z

## Updated at

2024-11-14T07:30:49.687192Z

## Published at

2024-11-14T07:30:49.803986Z

## Doi

https://doi.org/10.48505/nims.4956

## First published url

https://doi.org/10.1016/j.ijheatmasstransfer.2021.121766

## Date published

2021-07-30

## Recorded date published

2021-12

## Resource type

journal_article

## Manuscript type

accepted_manuscript

## Collection



## Title

- title: Interfacial thermal resistance of metal-nonmetal interfaces under bidirectional
    heat fluxes
  title_type: original
  lang: en

## Description

- description: Interfacial thermal resistance (ITR) at metal/nonmetal interfaces is
    a crucial issue affecting the efficiency of electronic devices. We investigated
    the ITR of Ni/Al2O3 and W/Al2O3 interfaces under the influence of bidirectional
    heat fluxes, with the heat flowing from the metal to the nonmetal and vice versa,
    using the time domain thermoreflectance technique. An asymmetric ITR was first
    experimentally observed such that the ITR was larger by a factor of 1.4–1.9 when
    the heat was applied from the nonmetal side, relative to the metal side. The additional
    interfacial electron–phonon couplings induced by the temperature difference between
    the hot electrons and phonons, which occur upon heating from the metal side, could
    be one of the plausible reasons causing the asymmetry. The thermal resistance
    of the interfacial electron–phonon coupling is found to be comparable with the
    phonon–phonon coupling. This new approach may allow us to elucidate thermal rectification
    at metal/nonmetal interfaces, thus leading to the development of light-controlled
    thermal diodes.
  description_type: abstract
  lang: und

## Creator

- name: Yen-Ju Wu
  role: author
  orcid: https://orcid.org/0000-0003-2647-3407
  organization: National Institute for Materials Science
  ror: https://ror.org/026v1ze26
- name: Takashi Yagi
  role: author
- name: Yibin Xu
  role: author
  orcid: https://orcid.org/0000-0001-8600-8748
  organization: National Institute for Materials Science
  ror: https://ror.org/026v1ze26

## Contact agent



## Publisher

organization: Elsevier BV

## Managing organization



## Keyword

- subject: Interfacial thermal resistance
  schema: not_defined
- subject: electron-phonon coupling
  schema: not_defined
- subject: phonon diodes
  schema: not_defined
- subject: hot electron
  schema: not_defined
- subject: light-controlled devices
  schema: not_defined

## Rights

- identifier: https://creativecommons.org/licenses/by-nc-nd/4.0/

## Other identifier(s)



## Data origin

- data_origin_type: other

## Embargo



## Journal

- title: International Journal of Heat and Mass Transfer
  issn: '00179310'
  volume: '180'
  article_number: '121766'

## Conference



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## Measurement method



## Specimen



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## Fileset

- id: 41466b20-3b0d-4423-8a55-eb9807101d8c
  filename: manuscript_revised_final.docx
  content_type: application/vnd.openxmlformats-officedocument.wordprocessingml.document
  size: 1173523
  md5: be7788c97153b11d190e58884a39e41f

## Thumbnail

fileset_id: 41466b20-3b0d-4423-8a55-eb9807101d8c
filename: manuscript_revised_final.docx