# Near-vertical plasma-free HCl gas etching on (011) β-Ga<sub>2</sub>O<sub>3</sub>

https://mdr.nims.go.jp/datasets/521019d2-dd53-4bac-b43f-0f7e4fb330c0

## File

- [Final_version.docx](https://mdr.nims.go.jp/filesets/ba2c23b3-f249-4182-a27f-c20d0757089e/download) ([Detail](https://mdr.nims.go.jp/filesets/ba2c23b3-f249-4182-a27f-c20d0757089e.md))
- [Suplementary.pdf](https://mdr.nims.go.jp/filesets/c1a67f44-816e-4026-bb18-91a926886cd5/download) ([Detail](https://mdr.nims.go.jp/filesets/c1a67f44-816e-4026-bb18-91a926886cd5.md))

## Id

521019d2-dd53-4bac-b43f-0f7e4fb330c0

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2025-02-17T01:35:58.441517Z

## Updated at

2026-01-24T06:43:35.931832Z

## Published at

2026-01-24T03:48:15.525766Z

## Doi

https://doi.org/10.48505/nims.5326

## First published url

https://doi.org/10.35848/1347-4065/ada706

## Date published

2025-01-01

## Recorded date published

2025-1-1

## Resource type

journal_article

## Manuscript type

accepted_manuscript

## Collection



## Title

- title: Near-vertical plasma-free HCl gas etching on (011) β-Ga<sub>2</sub>O<sub>3</sub>
  title_type: original
  lang: en

## Description

- description: We investigated non-plasma HCl-gas etching properties on (011) β-Ga2O3,
    which is an attracting surface orientation allowing pit-free homoepitaxy. The
    etching occurred selectively in window regions of a patterned SiO2 mask, and resulting
    side-etched structures were dependent on the in-plane directions of the window
    edges. Particularly, the side etching markedly reduced when the windows aligned
    with the [01-1] direction due to the formation of (100)-faceted sidewalls. Although
    the (100) sidewalls were slightly tilted from the surface normal by 6.5°, their
    surfaces were flat and free of plasma damage. Therefore, the crystallographic
    etching could be a promising microfabrication process on (011) β-Ga2O3.
  description_type: abstract
  lang: und

## Creator

- name: Takayoshi Oshima
  role: author
  orcid: https://orcid.org/0000-0001-8550-9735
- name: Yuichi Oshima
  role: author
  orcid: https://orcid.org/0000-0001-8293-4891

## Contact agent



## Publisher

organization: IOP Publishing

## Managing organization



## Keyword

- subject: Ga2O3
  schema: not_defined
- subject: crystallographic etching
  schema: not_defined
- subject: "(011)"
  schema: not_defined

## Rights

- description: This is the Accepted Manuscript version of an article accepted for
    publication in Japanese Journal of Applied Physics.  IOP Publishing Ltd is not
    responsible for any errors or omissions in this version of the manuscript or any
    version derived from it.  The Version of Record is available online at https://dx.doi.org/10.1088/1361-648X/ad906c.
  identifier: https://creativecommons.org/licenses/by-nc-nd/4.0/

## Other identifier(s)



## Data origin

- data_origin_type: other

## Embargo

start_date: 2025-01-24
end_date: 2026-01-24

## Journal

- title: Japanese Journal of Applied Physics
  issn: '00214922'
  volume: '64'
  issue: '1'
  article_number: '018003'

## Conference



## Related item



## Funding

- funder_name: TEPCO Memorial Foundation
- identifier: JP24K01368
  funder_name: Japan Society for the Promotion of Science

## Instrument



## Instrument operator



## Instrument managing organization



## Measurement method



## Specimen



## Chemical composition



## Structure for specimen



## Structural feature for specimen



## Specific property for specimen



## Process for specimen treatment



## Computational method



## Energy level/transition state



## Software



## Custom property



## Fileset

- id: ba2c23b3-f249-4182-a27f-c20d0757089e
  filename: Final_version.docx
  content_type: application/vnd.openxmlformats-officedocument.wordprocessingml.document
  size: 16432407
  md5: 7ada3c0cca0f80ed8f05319816b9cdd2
- id: c1a67f44-816e-4026-bb18-91a926886cd5
  filename: Suplementary.pdf
  content_type: application/pdf
  size: 9803443
  md5: 83882c0c6f925285c68ddf66f1924212

## Thumbnail

fileset_id: c1a67f44-816e-4026-bb18-91a926886cd5
filename: Suplementary.pdf