# Top-down fabrication of Ge nanowire arrays by nanoimprint lithography and hole gas accumulation in Ge/Si core–shell nanowires

https://mdr.nims.go.jp/datasets/5016b6c4-a268-4960-9b50-06227fde0a22

## Files

- [Top-down fabrication of Ge nanowire arrays by nanoimprint lithography and hole gas accumulation in GeSi core–shell nanowires.pdf](https://mdr.nims.go.jp/filesets/8997d576-d4f6-4889-8252-7c2acfa2ac94/download) ([Detail](https://mdr.nims.go.jp/filesets/8997d576-d4f6-4889-8252-7c2acfa2ac94.md))

## Id

5016b6c4-a268-4960-9b50-06227fde0a22

## Local identifier



## Visibility

open_to_public

## State

published

## Created at

2024-08-16T01:32:55.739111Z

## Updated at

2025-10-21T06:50:34.701989Z

## Published at

2025-10-21T06:45:52.115676Z

## Doi

https://doi.org/10.48505/nims.4678

## First published url

https://doi.org/10.1016/j.apsusc.2023.158656

## Date published

2023-10-11

## Recorded date published

2024-1

## Resource type

journal_article

## Manuscript type

accepted_manuscript

## Collection



## Title

- title: Top-down fabrication of Ge nanowire arrays by nanoimprint lithography and
    hole gas accumulation in Ge/Si core–shell nanowires
  title_type: original
  lang: en

## Description

- description: トップダウン手法を利用してGeナノワイヤの配列制御と縦型トランジスタチャネル実現のためのGe/Siコアシェルヘテロ接合形成に関する研究成果
  description_type: abstract
  lang: und

## Creator

- name: Yong-Lie Sun
  role: author
  orcid: https://orcid.org/0000-0003-1113-1658
  organization: National Institute for Materials Science
  ror: https://ror.org/026v1ze26
- name: Wipakorn Jevasuwan
  role: author
  orcid: https://orcid.org/0000-0001-9117-2497
  organization: National Institute for Materials Science
  ror: https://ror.org/026v1ze26
- name: Naoki Fukata
  role: author
  orcid: https://orcid.org/0000-0002-0986-8485
  organization: National Institute for Materials Science
  ror: https://ror.org/026v1ze26

## Contact agent



## Publisher

organization: Elsevier BV

## Managing organization



## Keyword

- subject: Ge nanowire
  schema: not_defined
- subject: Nanoimprint lithography
  schema: not_defined
- subject: Hole gas
  schema: not_defined
- subject: Core–shell
  schema: not_defined

## Rights

- description: "© 2023. Licensed under the Creative Commons https://creativecommons.org/licenses/by-nc-nd/4.0/"
  identifier: https://creativecommons.org/licenses/by-nc-nd/4.0/

## Other identifier(s)



## Data origin

- data_origin_type: other

## Embargo

start_date: 2023-10-11
end_date: 2025-10-11

## Journal

- title: Applied Surface Science
  issn: '01694332'
  volume: '643'
  article_number: '158656'

## Conference



## Related item



## Funding

- identifier: 21J11537
  funder_name: Japan Society for the Promotion of Science
- funder_name: Ministry of Education, Culture, Sports, Science and Technology

## Instrument



## Instrument operator



## Instrument managing organization



## Measurement method



## Specimen



## Chemical composition



## Structure for specimen



## Structural feature for specimen



## Specific property for specimen



## Process for specimen treatment



## Computational method



## Energy level/transition state



## Software



## Custom property



## Fileset

- id: 8997d576-d4f6-4889-8252-7c2acfa2ac94
  filename: Top-down fabrication of Ge nanowire arrays by nanoimprint lithography
    and hole gas accumulation in GeSi core–shell nanowires.pdf
  content_type: application/pdf
  size: 1364793
  md5: 0db3bacfc601e561cfe9df5239aa3ab8

## Thumbnail

fileset_id: 8997d576-d4f6-4889-8252-7c2acfa2ac94
filename: Top-down fabrication of Ge nanowire arrays by nanoimprint lithography and
  hole gas accumulation in GeSi core–shell nanowires.pdf