@misc{rahmat2024a,
  title = {High Doping Activation (≥1020 cm−3) in Tensile-Strained n‑Ge Alloys Achieved by High-Speed Continuous-Wave Laser Annealing},
  author = {Rahmat Hadi Saputro, Tatsuro Maeda, Kaoru Toko, Ryo Matsumura, Naoki Fukata},
  publisher = {American Chemical Society},
  year = {2024-06-25},
  keywords = {germanium, thin film, polycrystalline growth, laser annealing, impurity doping}
}