@article{li,
  title = {Reliability Challenges in Equivalent-Oxide-Thickness Scaling with High-κ Er<sub>2</sub>O<sub>3</sub> Dielectrics on Two-Dimensional MoS<sub>2</sub> Field-Effect Transistors},
  author = {Shuhong Li, Ryotaro Otake, Tomonori Nishimura, Takashi Taniguchi, Kenji Watanabe, Yoshiki Sakuma, Kosuke Nagashio},
  publisher = {American Chemical Society (ACS)},
  year = {2025},
  keywords = {High-κ dielectric, MoS2, 2D semiconductor}
}