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説明:

The thermo-reflectance technique is one of the few methods which can measure thermal diffusivity of thin films as thin as 100 nm or thinner in the cross-plane direction. Up to now it has typically only been possible to attempt to evaluate the interfacial thermal resistance between the thin films by preparing and measuring several samples with different thicknesses. In this study, a method to directly determine interfacial thermal resistance by a single measurement of a thin film on substrate is represented, by analyzing the shape of thermo-reflectance signals with analytical solutions in frequency domain and time domain. Thermo-reflectance signals observed from metallic thin films on sapphire substrate with different thickness steps were analyzed by Fourier analysis and fitted by analytical equations with four parameters: heat diffusion time across the first layer, ratio of virtual heat sources, characteristic time of cooling determined by interfacial thermal resistance and relative amplitude of the signal. Interface thermal resistance between the thin film and substrate was able to be determined reliably with smaller uncertainty.

権利情報:

• Creative Commons BY Attribution 4.0 International
  

キーワード: thermal conductivity

刊行年月日: 2024-02-01

出版者: Springer Science and Business Media LLC

掲載誌:

• International Journal of Thermophysics (ISSN: 0195928X) 27

研究助成金:

• JST-Mirai Program JPMJMI19A1
• Japan Science and Technology Agency JPMJSP2124

原稿種別: 出版者版 (Version of record)

MDR DOI:

公開URL: https://doi.org/10.1007/s10765-023-03324-w

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更新時刻: 2024-08-01 08:30:09 +0900

MDRでの公開時刻: 2024-08-01 08:30:09 +0900