International Center for Materials Nanoarchitectonics (WPI-MANA)
(National Institute for Materials Science
)
Collection
Citation
Description:
(abstract)MANA researchers have developed the world's highest performance thin-film capacitors using a new high-permittivity (high-κ) dielectric sheet with molecular-level thickness (~1 nm). This technology may revolutionize the next-generation electronics.
Rights:
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In Copyright
In Copyright
Keyword: Exfoliation, Nanosheets, Solution process, Layer-by-layer assembly, Energy conversion & storage, Dielectric nanofilms, Seed layer for heteroepitaxy, Oxide nanosheets, Zeolite nanosheets, Colloidal suspensions, Multilayer films
Date published: 2012-01-04
Publisher: National Institute for Materials Science
Journal:
- MANA E-BULLETIN vol. 2
Funding:
Manuscript type: Publisher's version (Version of record)
MDR DOI: https://doi.org/10.48505/nims.3742
First published URL: https://www.nims.go.jp/mana/research/highlights/vol2.html
Related item:
- refers
- (dataset)
- https://doi.org/10.1002/adfm.201100580
Other identifier(s):
Contact agent:
Updated at: 2023-12-25 00:30:13 +0900
Published on MDR: 2022-12-16 14:14:42 +0900
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[Vol. 2]High-performance thin film boost for electronics research_ WPI-MANA.pdf
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