雑誌 [Research Highlights Vol.2] High-Performance Thin Film Boost for Electronics Research

International Center for Materials Nanoarchitectonics (WPI-MANA) (National Institute for Materials ScienceROR)

コレクション

Research Highlights

引用
International Center for Materials Nanoarchitectonics (WPI-MANA). [Research Highlights Vol.2] High-Performance Thin Film Boost for Electronics Research. https://doi.org/10.48505/nims.3742

説明:

(abstract)

MANA researchers have developed the world's highest performance thin-film capacitors using a new high-permittivity (high-κ) dielectric sheet with molecular-level thickness (~1 nm). This technology may revolutionize the next-generation electronics.

権利情報:

キーワード: Exfoliation, Nanosheets, Solution process, Layer-by-layer assembly, Energy conversion & storage, Dielectric nanofilms, Seed layer for heteroepitaxy, Oxide nanosheets, Zeolite nanosheets, Colloidal suspensions, Multilayer films

刊行年月日: 2012-01-04

出版者: National Institute for Materials Science

掲載誌:

  • MANA E-BULLETIN vol. 2

研究助成金:

原稿種別: 出版者版 (Version of record)

MDR DOI: https://doi.org/10.48505/nims.3742

公開URL: https://www.nims.go.jp/mana/research/highlights/vol2.html

関連資料:

その他の識別子:

連絡先:

更新時刻: 2023-12-25 00:30:13 +0900

MDRでの公開時刻: 2022-12-16 14:14:42 +0900

ファイル名 サイズ
ファイル名 [Vol. 2]High-performance thin film boost for electronics research_ WPI-MANA.pdf (サムネイル)
application/pdf
サイズ 100KB 詳細