International Center for Materials Nanoarchitectonics (WPI-MANA)
(National Institute for Materials Science)
説明:
(abstract)MANA researchers have developed the world's highest performance thin-film capacitors using a new high-permittivity (high-κ) dielectric sheet with molecular-level thickness (~1 nm). This technology may revolutionize the next-generation electronics.
権利情報:
キーワード: Exfoliation, Nanosheets, Solution process, Layer-by-layer assembly, Energy conversion & storage, Dielectric nanofilms, Seed layer for heteroepitaxy, Oxide nanosheets, Zeolite nanosheets, Colloidal suspensions, Multilayer films
刊行年月日: 2012-01-04
出版者: National Institute for Materials Science
掲載誌:
研究助成金:
原稿種別: 出版者版 (Version of record)
MDR DOI: https://doi.org/10.48505/nims.3742
公開URL: https://www.nims.go.jp/mana/research/highlights/vol2.html
関連資料:
その他の識別子:
連絡先:
更新時刻: 2023-12-25 00:30:13 +0900
MDRでの公開時刻: 2022-12-16 14:14:42 +0900
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[Vol. 2]High-performance thin film boost for electronics research_ WPI-MANA.pdf
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application/pdf |
サイズ | 100KB | 詳細 |