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Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam
Description/Abstract:
We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:
Auger Depth Profiling analysis
,
HfO2/Si
, and
Ultra Low Angle Incidence Ion Beam
Material/Specimen:
HfO2
Resource Type:
Article
Author:
Yoshikawa, Hideki
,
Ogiwara, Toshiya
, and
Nagata, Takahiro
Journal:
Journal of Surface Analysis
Date Uploaded:
25/05/2021
Date Modified:
26/05/2021
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1
Keyword
Auger Depth Profiling analysis
1
HfO2/Si
1
Ultra Low Angle Incidence Ion Beam
1
Language
Japanese
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1
Publisher
Surface Analysis Society of Japan
1
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Article
1
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open
1
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In Copyright
1
Material/Specimen
HfO2
[remove]
1
Author
Nagata, Takahiro
1
Ogiwara, Toshiya
1
Yoshikawa, Hideki
1
Journal
Journal of Surface Analysis
1