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SiO2/Si
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試料冷却法を併用したAES深さ方向分析によるSiO2/Si熱酸化膜の分析
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Auger Depth Profiling Analysis
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Sample Cooling Method
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SiO2/Si
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Japanese
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Surface Analysis Society of Japan
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SiO2:103nm/Si-Substrate
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Ogiwara, Toshiya
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Tanuma, Shigeo
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Journal of Surface Analysis
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