Skip to Content
Toggle navigation
Home
About
Help
Contact
Login
Search MDR
Go
Search Constraints
Start Over
Filtering by:
Keyword
AES
Remove constraint Keyword: AES
1
-
3
of
3
Sort by date modified ▼
relevance
date uploaded ▼
date uploaded ▲
date modified ▼
date modified ▲
Number of results to display per page
100 per page
10
per page
20
per page
50
per page
100
per page
View results as:
List
Gallery
Masonry
Slideshow
Search Results
オージェ電子分光法における背面散乱補正 I.広い分析条件で使用可能な電子の背面散乱補正式の開発
Description/Abstract:
AESによる表面定量分析において重要な電子の背面散乱について検討した.電子の背面散乱係数の入射角度依存性,およびそのエネルギーの平均値および中央値について,モンテカルロ(MC)法を用いてBe, B, C, Al, Si, Cu, Zr, Ag, La, Auの10種類の元素...
Keyword:
AES
,
Auger electron spectroscopy
,
electron backscattering correction
, and
predictive formula for back scattering correction
Resource Type:
Article
Author:
田沼 繁夫
Journal:
JOURNAL OF SURFACE ANALYSIS
Date Uploaded:
29/06/2023
Determination of Inelastic Mean Free Paths in Elemental Solids in the 200 to 5000 eV Energy Range by Absolute Elastic Peak Electron Spectroscopy
Description/Abstract:
Recently Goto have done a precise measurement of transmission efficiency using a new method. Then, we have carried out the experimental d...
Keyword:
AES
,
IMFP
,
TPP-2M
, and
XPS
Resource Type:
Presentation
Author:
Tanuma,S
,
Okamoto, N
,
Azuma, Y
,
Kimura, T
, and
Goto, K
Date Uploaded:
07/07/2023
Date Modified:
07/07/2023
Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 — Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy —Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
Description/Abstract:
ISO 18118 provides guidance on the measurement and use of experimentally determined relative sensitivity factors for the quantitative ana...
Keyword:
AES
,
Auger electron spectroscopy
,
ISO
,
International Organization for Standardization
,
X-ray photoelectron spectroscopy
,
XPS
,
quantitative surface analysis
, and
relative sensitivity factor
Resource Type:
Article
Author:
TANUMA, Shigeo
Journal:
Surface and Interface Analysis
Date Uploaded:
08/10/2020
Date Modified:
01/07/2021
Toggle facets
Limit your search
Type of work
Publication
3
Keyword
AES
[remove]
3
Auger electron spectroscopy
2
XPS
2
IMFP
1
ISO
1
more
Keywords
»
Language
English
2
Japanese
1
Publisher
Czech Vacuum Society
1
Wiley
1
一般社団法人 表面分析研究会
1
Resource type
Article
2
Presentation
1
Visibility
open
3
Rights Statement Sim
Creative Commons BY-NC Attribution-NonCommercial 4.0 International
2
In Copyright
1
Author
Azuma, Y
1
Goto, K
1
Kimura, T
1
Okamoto, N
1
TANUMA, Shigeo
1
more
Authors
»
License
http://rightsstatements.org/vocab/InC/1.0/
1
Journal
JOURNAL OF SURFACE ANALYSIS
1
Surface and Interface Analysis
1