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Magnetism of the spin-1 tetramer compound A2Ni2Mo3O12 (A = Rb or K)
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Magnetism of the antiferromagnetic spin-3/2 dimer compound CrVMoO7 having an antiferromagnetically ordered state
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Magnetism of the antiferromagnetic spin-1/2 tetramer compound CuInVO5
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A Possible Magnetic Structure of the Cluster-Based Haldane Compound Fedotovite K2Cu3O(SO4)3
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MDTS: automatic complex materials design using Monte Carlo tree search
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Structure prediction of boron-doped graphene by machine learning
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Monte Carlo tree search for materials design and discovery
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Program for automatic numerical conversion of a line graph (line plot)
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Conduction band caused by oxygen vacancies in aluminum oxide for resistance random access memory
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Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 — Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy —Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
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