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Hirayama, Taisei
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Conduction band caused by oxygen vacancies in aluminum oxide for resistance random access memory
Description/Abstract:
As a next-generation memory, we have developed a rare-metal-free memory using Al oxide with a high-density of oxygen vacancies (Vos). Th...
Keyword:
Crystallographic defects
,
Electrical properties and parameters
,
Electronic bandstructure
,
First-principle calculations
,
Random access memory
,
Resistive switching
,
Thermally stimulated current spectroscopy
,
Transmission electron microscope
,
electron energy loss spectroscopy
, and
semiconductor structures
Resource Type:
Article
Author:
Harada, Yoshitomo
,
Kido, Giyuu
,
Hirayama, Taisei
,
Kato, Seiichi
,
Nigo, Seisuke
,
Kubota, Masato
, and
Kitazawa, Hideaki
Journal:
journal of applied physics
Date Uploaded:
05/10/2020
Date Modified:
06/10/2020
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Crystallographic defects
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Electrical properties and parameters
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Electronic bandstructure
1
First-principle calculations
1
Random access memory
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English
1
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American Institute of Physics
1
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In Copyright
1
Date
2012
1
Author
Harada, Yoshitomo
1
Hirayama, Taisei
1
Kato, Seiichi
1
Kido, Giyuu
1
Kitazawa, Hideaki
1
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http://rightsstatements.org/vocab/InC/1.0/
1
Journal
journal of applied physics
1