Index Catalog // MDR

Description/Abstract:: We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:: Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam
Resource Type:: Dataset
Data origin:: experiments
Author:: OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki
Date Uploaded:: 07/08/2023

Description/Abstract:: We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:: Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam
Resource Type:: Dataset
Data origin:: experiments
Author:: OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki
Date Uploaded:: 13/07/2023
Date Modified:: 07/08/2023

Description/Abstract:: We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:: Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam
Resource Type:: Dataset
Data origin:: experiments
Author:: OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki
Date Uploaded:: 23/06/2023
Date Modified:: 18/07/2023

Description/Abstract:: We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:: Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam
Resource Type:: Dataset
Data origin:: experiments
Author:: OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki
Date Uploaded:: 29/05/2023
Date Modified:: 26/06/2023

Description/Abstract:: We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:: Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam
Resource Type:: Dataset
Data origin:: experiment
Author:: OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki
Date Uploaded:: 20/04/2023

Description/Abstract:: We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:: Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam
Resource Type:: Dataset
Data origin:: experiments
Author:: OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki
Date Uploaded:: 09/02/2023
Date Modified:: 30/03/2024

Description/Abstract:: We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:: Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam
Resource Type:: Dataset
Data origin:: experiments
Author:: OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki
Date Uploaded:: 21/12/2022
Date Modified:: 09/02/2023

Description/Abstract:: We have investigated the Auger depth profiling analysis of HfO2/Si by the glancing-angle ion beam sputtering method at an incident angle ...
Keyword:: Auger depth profiling analysis, HfO2/Si, and Ultra low angle incidence ion beam
Resource Type:: Dataset
Data origin:: experiments
Author:: OGIWARA, Toshiya, NAGATA, Takahiro, and YOSHIKAWA, Hideki
Date Uploaded:: 22/11/2022
Date Modified:: 30/05/2023

Description/Abstract:: The energy loss function (ELF) describes the interaction between electrons and matter in solids. It is essential for understanding quanti...
Keyword:: compound semiconductor, energy loss function, first-principles calculation, and optical constant
Resource Type:: Dataset
Data origin:: simulations
Author:: SHINOTSUKA, Hiroshi, YOSHIKAWA, Hideki, and TANUMA, Shigeo
Journal:: e-Journal of Surface Science and Nanotechnology
Date Uploaded:: 18/01/2021
Date Modified:: 07/07/2021

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